Volume 23, Issue 2 (JIAEEE Vol.23 No.2 2026)
Journal of Iranian Association of Electrical and Electronics Engineers 2026, 23(2): 50-58 |
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Soraya M, Parsanasab G, Hajshahvaladi L. Nanolithography Using the Femtosecond Direct Laser Writing Method. Journal of Iranian Association of Electrical and Electronics Engineers 2026; 23 (2) :50-58
URL: http://jiaeee.com/article-1-1771-en.html
URL: http://jiaeee.com/article-1-1771-en.html
Shahid Beheshti university
Abstract: (60 Views)
This research has examined the process of nanolithography using the femtosecond laser direct writing method. Nanolithography is an advanced technology that enables the fabrication of microscopic and nanoscale structures. This process, in addition to the ability to produce very small and fast electronic devices such as micro and nanochips, is also used in the fabrication of flexible and powerful nanophotonic components for integrated photonic circuits. Using this technique, the ability to fabricate waveguides and micro-rings with very smooth surfaces has been investigated, which leads to a significant reduction in optical loss during wave propagation in these structures. This technology can be very useful in improving the efficiency and performance of various devices.
Keywords: : Integrated photonic circuits, Nanolithography, Femtosecond laser direct writing method, optical waveguides, Microring, Optical loss, Two photon Absorption
Type of Article: Research |
Subject:
Electronic
Received: 2024/11/5 | Accepted: 2026/06/4 | Published: 2026/06/22
Received: 2024/11/5 | Accepted: 2026/06/4 | Published: 2026/06/22
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